RF DC Sputtering Unit
Specifications of RF DC Sputtering Unit
- Vacuum Chamber : "D" Shape / Cylindrical Chamber
- Pumping System : Diffusion / Turbo Pumping System
- Vacuum Gauges : Digital / Analog – Pirani & Penning Gauges
- Substrate Holder with Spring clips arrangement
- Substrate Heating & Rotation Mechanism
- Mode : Sputter Up / Sputter Down
- Flexible Magnetron Cathodes with shutter : 2" / 3"
- Substrate to Cathode distance arrangement
- Mass Flow Controllers for gas introducing
- RF 300 Watts / RF 600 Watts Power Supply with auto matching network
- DC 1 KW Power Supply