Specifications of RF DC Sputtering Unit

• Vacuum Chamber : "D" Shape / Cylindrical Chamber
• Pumping System : Diffusion / Turbo Pumping System
• Vacuum Gauges : Digital / Analog – Pirani & Penning Gauges
• Substrate Holder with Spring clips arrangement
• Substrate Heating & Rotation Mechanism
• Mode : Sputter Up / Sputter Down
• Flexible Magnetron Cathodes with shutter : 2" / 3"
• Substrate to Cathode distance arrangement
• Mass Flow Controllers for gas introducing
• RF 300 Watts / RF 600 Watts Power Supply with auto matching network
• DC 1 KW Power Supply