RF DC Sputtering Unit

Specifications of RF DC Sputtering Unit

  • Vacuum Chamber : "D" Shape / Cylindrical Chamber
  • Pumping System : Diffusion / Turbo Pumping System
  • Vacuum Gauges : Digital / Analog – Pirani & Penning Gauges
  • Substrate Holder with Spring clips arrangement
  • Substrate Heating & Rotation Mechanism
  • Mode : Sputter Up / Sputter Down
  • Flexible Magnetron Cathodes with shutter : 2" / 3"
  • Substrate to Cathode distance arrangement
  • Mass Flow Controllers for gas introducing
  • RF 300 Watts / RF 600 Watts Power Supply with auto matching network
  • DC 1 KW Power Supply
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