Vacuum Deposition Systems
RF/DC Magnetron Sputtering System
Our RF/DC Magnetron Sputtering Systems are designed for thin film deposition of metals, oxides,and compound materials. These systems offer precise control over film thickness, composition, anduniformity.
Key Features:
- Single or multi-target configurations
- RF, DC, or combined power supply modes
- Substrate heating and bias options
- Automatic pressure control with mass flow controllers
- Compact, modular design for research and industrial use
Applications: Thin film coatings, semiconductor devices, optical films, nanostructures.
Thermal Evaporation System
The Thermal Evaporation Unit enables controlled deposition of high-purity films under vacuum using resistive or electron beam heating.
Key Features:
High-vacuum compatible chamber
Quartz crystal thickness monitor
Resistive heating sources (boat, filament, or crucible)
Optional substrate rotation and heating
Easy-to-maintain modular design
Applications: Metal and oxide film deposition, optical coatings, sensor fabrication.
Chemical Vapor Deposition (CVD) System
Our CVD Systems are engineered for uniform thin film formation through chemical reactions undercontrolled temperature and pressure.
Key Features:
Horizontal or vertical quartz tube furnace
Precise gas flow control using MFCs
Automated temperature and process monitoring
Safety interlocks and exhaust system integration