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Chemical Vapour Deposition System

Chemical Vapour Deposition (CVD) Systems

Advanced Thin-Film Deposition & Material Synthesis

Our Chemical Vapour Deposition (CVD) Systems are designed for the controlled synthesis and deposition of thin films, coatings, nanomaterials and advanced functional materials.

The systems provide precise control of temperature, pressure, gas flow and precursor delivery, enabling repeatable and uniform deposition for research, development and industrial applications.

Technical Specifications

High-temperature CVD reactor
Quartz tube or custom vacuum chamber
Single-zone or multi-zone heating
Precise temperature control
Mass Flow Controllers (MFCs)
Controlled precursor delivery
Argon / nitrogen / hydrogen process-gas options
Vacuum and reduced-pressure operation
Rotary / dry / turbo pumping options
Vacuum and pressure monitoring
Programmable heating profiles
Substrate holder and fixtures
PLC/HMI-based control
Data logging and process monitoring
Gas and vacuum safety interlocks
Customized reactor configurations

Request a Technical & Commercial Proposal

Share your material to be deposited, precursor, substrate size, operating temperature, pressure and required number of substrates with us.

Our engineering team can recommend the appropriate CVD reactor, heating system, gas-delivery system, vacuum system and control architecture for your application.

Customized Configuration
Technical Consultation
Reliable Support
Talk to Our Technical Team Request a Quote