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Sputtering System

RF/DC Sputtering Systems

Advanced Thin-Film Deposition Solutions

Our sputtering systems are designed for high-quality thin-film deposition, research, development, and industrial coating applications. The systems are engineered to provide precise control over vacuum conditions, plasma parameters, substrate temperature, deposition rate, and film thickness.

We offer RF, DC, and Pulsed DC sputtering systems in customized configurations to meet specific material, substrate, and process requirements.

Technical Specifications

High-vacuum deposition chamber designed for reliable and repeatable operation
RF, DC and Pulsed DC sputtering configurations
Single or multiple magnetron sources
Compatible with metallic, conductive and insulating target materials
High-performance turbo molecular pumping system
Dry or rotary vane backing pump options
Substrate heating and temperature control
Substrate rotation for uniform film deposition
Advanced vacuum measurement and monitoring
Digital control of sputtering parameters
Gas flow control using precision mass flow controllers
Argon and reactive gas deposition capability
Film thickness monitoring options
Custom chamber configurations based on application requirements
PLC/HMI-based system control available

Looking for a Reliable Sputtering System?

Looking for a sputtering system for thin-film research, semiconductor development, nanomaterials, optical coatings or advanced materials research?

Contact us with your required substrate size, target material, number of targets and desired deposition process, and we can develop a suitable sputtering-system configuration for your application.

Digital vacuum monitoring
Precise deposition-rate control
PLC/HMI-based control options
Talk to Our Technical Team Request a Quote