Chemical Vapor Deposition Unit

It will be mainly used for CNT & graphene growth

Specifications of Chemical Vapor Deposition Unit

• High Temperature Tubular Furnace :
  Single Zone / Two Zone / Three Zone
• Tube Quartz : upto 12000 C (OR) Alumina: upto 14000 C
• Vacuum Pumping System
• Vacuum Valves
• Vacuum Gauges
• Temperature Controllers
• Gas mixing chamber
• Mass Flow Controllers : Argon / Hydrogen / Methane / Acetylene